2010-2013 Associate Head, Chemical Engineering Program, UConn 2008-2010 Senior R&D Engineer, GVD Corporation, Cambridge, MA 2003-2008 Assistant Professor of Chemical Engineering, Northeastern University, Boston, MA

“Technology in the Classroom: Transitioning Lab and Design to an All-Digital Workflow”, D. Anastasio, A. Suresh, and D. D. Burkey, Chemical Engineering Education, 47(1) 65-70 (2012). “Precise, Biomimetic Replication of the Multi-Scale Structure of Intestinal Basement Membrane using Chemical Vapor Deposition”, C. A. Pfluger, B. J. McMahon, R. L. Carrier, and D .D. Burkey, Tissue Engineering Part A, 19(5-6), 649-656 (2012). “Biocompatibility of Plasma Enhanced Chemical Vapor Deposited Poly(2-hydroxyethyl methacrylate) Films for Biomimetic Replication of the Intestinal Basement Membrane”, C. A. Pfluger, D. D. Burkey, L. Wang, B. Sun, K. S. Ziemer, and R. L. Carrier, Biomacromolecules, 11(6) 1579-1584 (2010). “Cross-linking and Degradation Properties of Plasma Enhanced Chemical Vapor Deposited Poly(2-hydroxymethacrylate)”, C. A. Pfluger, R. L. Carrier, B. Sun, K. S. Ziemer and D. D. Burkey, Macromolecular Rapid Communications, 30 126-132 (2009). “Instant Messaging: Expanding Your Office Hours”, D. D. Burkey and R. J. Willey, Chemical Engineering Education, 39(3) 183-185 (2005). “Temperature-resolved Fourier transform infrared study of condensation reactions and porogen decomposition in hybrid organosilicon-porogen films”, D. D. Burkey and K. K. Gleason, Journal of Vacuum Science and Technology A, 22(1) 61-70 (2004) “Organosilicon thin films deposited from cyclic and acyclic precursors using water as an oxidant”, D. D. Burkey and K .K. Gleason, Journal of the Electrochemical Society, 151(5) F105-F112 (2004). “Structure and mechanical properties of thin films deposited from 1,3,5-trimethyl-1,3,5,-trivinylcylcotrisiloxane and water”, D. D. Burkey and K. K. Gleason, Journal of Applied Physics, 93(9) 5143-5150 (2003). “Structure and thermal stability of thin-film poly(alpha-methylstyrene) deposited via plasma-enhanced chemical vapor deposition”, D. D. Burkey and K. K. Gleason, Chemical Vapor Deposition, 9(2) 65-71 (2003). “Mechanical properties of organosilicon thin films deposited from cyclic and acyclic precursors using water as an oxidant”, D. D. Burkey and K. K. Gleason, Materials Research Society Proceedings, 766, 273 (2003).