李秀燕 照片

李秀燕

教授

所属大学: 太原理工大学

所属学院: 物理与光电工程学院

邮箱:
lixiuyan@tyut.edu.cn

个人主页:
http://wuli.tyut.edu.cn/info/1248/2695.htm

个人简介

学习经历 1984年-1988年,南开大学,物理系,固体物理专业,本科/学士; 1988年-1991年, 南开大学,物理系,固体物理专业,研究生/硕士; 1999年-2003年,太原理工大学,材料加工工程专业,研究生/博士; 工作经历 2007年,比利时根特大学,理学院固态科学系,访问学者; 1991年-至今,太原理工大学物理与光电工程学院工作。

研究领域

利用磁控溅射、真空氧化等技术制备光电功能薄膜,并对其结构性能进行实验表征和计算模拟。

近期论文

1. X. Y. Li, B. Tang, J. R. Ye, Fabrication of Zr and Zr–N surface alloying layers and hardness improvement of Ti–6Al–4V alloy by plasma surface alloying technique,Applied Surface Science, 2012,258: 981–984.

2. Wang Hefeng,Li Xiuyan; Liu Weiyan,Tang Bin, Effects of C, N-Codoped on the corrosion resistance of TiO2 films prepared by plasma surface alloying and thermal oxidation duplex process, JOURNAL OF Wuhan University of Technology-Materials Science Edition, 2011, 26(3): 495-498.

3. D. Depla, X. Y. Li, S. Mahieu, K. Van Aeken, W. P. Leroy, J. Haemers,

R. De Gryse, and A. Bogaerts,Rotating cylindrical magnetron sputtering: Simulation of the reactive process,JOURNAL OF APPLIED PHYSICS,2010,107: 113307-1-9.

4. Li Xiuyan, Ye Jiaorong, Tang Bin, Study of the Ion Nitrided Layer on Ti-6Al-4V Substrate, Advanced Materials Research, 2009, 79-82:695-698.

5. X.Y. Li, D. Depla, W.P. Leroy, et al. Influence of deposition on the reactive sputter behaviour during rotating cylindrical magnetron sputtering, Journal of Physics D: Applied Physics, 2008,41: 035203.

6. D Depla, X Y Li, S Mahieu, et al. Determination of the effective electron emission yields of compound materials. Journal of Physics D – Applied Physics,2008,41: 202003.

7. Xiu-Yan Li, Pei-Qiang Wu, Bin Tang, et al. Fatigue behavior of plasma surface modified Ti–6Al–4 V alloy, Vacuum, 2005,79:52-57.

8. Xiuyan Li, Yongmei Li, Yanmei Qin, et al. Determination of the impact fatigue behavior of the Mo surface modified Ti6Al4V alloy. Material Science Forum,2005,475-479:1541-1544.