1979-1983年，南开大学物理系，理学学士； 1985-1988年，中国科学院长春光学精密机械研究所光学专业，理学硕士； 1996-1999年，四川大学物理科学与技术学院光学专业，理学博士。 自1985年以来，先后从事激光技术、信息光学、微纳加工技术和微纳光子学等领域的理论和实验研究工作，并于1996年到四川大学物理科学与技术学院任教至今，其中2001-2002年间，曾在英国卢瑟福实验室、新加坡南洋理工大学进行微纳光学方面的学术研究。目前，已在数字光刻、表面等离子激元光刻、远场超分辨成像技术、生物医学光子学技术、纳米光子结构在有机光电子器件应用等方面，主持/主研国家自然科学基金等科研项目20余项。在学术刊物上发表论文120余篇，SCI收录论文约50篇。

1. 金属/介质纳米结构光调控的理论和实验研究 2. 纳米光学结构加工方法和Metamaterals制备技术的研究 3. 纳米光子学在生物大分子成像中的应用研究 4. 光自旋霍尔效应、有机自旋电子学等

1. Y. Hou, S. Li, Y. Su, X. Huang, Y. Liu, L. Huang, Y. Yu, F. Gao, Z. Zhang, J. Du. Design and fabrication of three-dimensional chiral nanostructures based on stepwise glancing angle deposition technology. Langmuir. 2013, 29(3): 867-872. 2. Z. Y. Zhang, S. Ye, S. H. Li, Z. Yang, J. L. Du, F. H. Gao, R. Y. Shi, B. C. Yang, X. W. Guo. Fabrication of nanopore array based on the nanometer silver pore-mirror device. Microelectronic Engineering. 2012, 98: 151-154. 3. X. H. Sun, L. P. Xia, J. L. Du, S. Y. Yin, C. L. Du. A hybrid long-range surface plasmon waveguide comprising a narrow metal stripe surrounded by the low-index dielectric regions. Optics Communications. 2012, 285(21-22): 4359-4363. 4. S. Shi, Z. Y. Zhang, J. L. Du, Z. Yang, R. Y. Shi, S. H. Li, F. H. Gao. Surface-plasmon-polaritons-assisted nanolithography with dual-wavelength illumination for high exposure depth. Optics Letters. 2012, 37(2): 247-249. 5. Y. D. Hou, S. H. Li, S. Ye, S. Shi, M. G. Zhang, R. Y. Shi, J. L. Du, C. L. Du. Using self-assembly technology to fabricate silver particle array for organic photovoltaic devices. Microelectronic Engineering. 2012, 98: 428-432. 6. Y. K. Zhang, J. L. Du, X. Z. Wei, L. F. Shi, Q. L. Deng, X. C. Dong, C. L. Du. Resolution and stability analysis of localized surface plasmon lithography on the geometrical parameters of soft mold. Applied Optics. 2011, 50(13): 1963-1967. 7. S. Ye, Y. D. Hou, R. Y. Zhu, S. L. Gu, J. Q. Wang, Z. Y. Zhang, S. Shi, J. L. Du. Synthesis and Photoluminescence Enhancement of Silver Nanoparticles Decorated Porous Anodic Alumina. Journal of Materials Science & Technology. 2011, 27(2): 165-169. 8. L. L. Tang, J. C. Yin, G. S. Yuan, J. L. Du, H. T. Gao, X. C. Dong, Y. G. Lu, C. L. Du. General conformal transformation method based on Schwarz-Christoffel approach. Optics Express. 2011, 19(16): 15119-15126. 9. S. Shi, Z. Y. Zhang, R. Y. Shi, X. Y. Niu, S. H. Li, M. Li, J. Q. Wang, J. L. Du, F. H. Gao, C. L. Du. Analysis of fabricating arbitrary nanoscale patterns by LSPP direct writing lithography with two-dimensional metal hole-array. Microelectronic Engineering. 2011, 88(8): 1931-1934. 10. X. P. Li, S. Shi, Z. Y. Zhang, J. Q. Wang, S. H. Li, F. H. Gao, R. Y. Shi, J. L. Du, C. L. Du, Y. X. Zhang. Experimental analysis of solid immersion interference lithography based on backside exposure technique. Microelectronic Engineering. 2011, 88(8): 2509-2512. 11. Y. K. Zhang, X. C. Dong, J. L. Du, X. Z. Wei, L. F. Shi, Q. L. Deng, C. L. Du. Nanolithography method by using localized surface plasmon mask generated with polydimethylsiloxane soft mold on thin metal film. Optics Letters. 2010, 35(13): 2143-2145. 12. J. Q. Wang, H. M. Liang, X. Y. Niu, J. L. Du, S. Ye, Z. Y. Zhang. Enhancing exposure depth for surface-plasmon polaritons interference nanolithography by waveguide modulation. Journal of Applied Physics. 2010, 108(1): 014308. 13. S. Shi, Z. Y. Zhang, M. Y. He, X. P. Li, J. Yang, J. L. Du. Analysis of surface-plasmon-polaritons-assisted interference imaging by using silver film with rough surface. Optics Express. 2010, 18(10): 10685-10693. 14. X. Y. Niu, Y. M. Qi, J. Q. Wang, Z. Y. Zhang, J. L. Du, Y. K. Guo, R. Y. Shi, M. Gong. Approach of enhancing exposure depth for evanescent wave interference lithography. Microelectronic Engineering. 2010, 87(5-8): 1168-1171. 15. M. Y. He, Z. Y. Zhang, S. Shi, J. L. Du, X. P. Li, S. H. Li, W. Y. Ma. A practical nanofabrication method: surface plasmon polaritons interference lithography based on backside-exposure technique. Optics Express. 2010, 18(15): 15975-15980. 16. H. M. Liang, H. B. Wang, X. Y. Zhao, J. L. Du, J. G. Yang, Y. Ma, J. B. Li, S. L. Hu. High efficiency picosecond pulse C(6)H(12) Raman laser amplified by DCM fluorescence. Laser Physics. 2009, 19(3): 424-427. 17. Z. Y. Zhang, J. L. Du, X. W. Guo. High-efficiency transmission of nanoscale information by surface plasmon polaritons from near field to far field. Journal of Applied Physics. 2007, 102(7): 074301. 18. B. L. Luo, C. C. Wang, J. L. Du, C. Ma, Y. K. Guo, J. Yao. Design and analysis of phase gratings for laser beams coherent combination. Microelectronic Engineering. 2006, 83(4-9): 1368-1371. 19. X. W. Guo, J. L. Du, Y. K. Guo, J. Yao. Large-area surface-plasmon polariton interference lithography. Optics Letters. 2006, 31(17): 2613-2615. 20. S. J. Liu, J. L. Du, X. Duan, B. L. Luo, X. G. Tang, Y. K. Guo, Z. Cui, C. L. Du, J. Yao. Enhanced Dill exposure model for thick photoresist lithography. Microelectronic Engineering. 2005, 78-79: 490-495.